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Accounting for Lens aberrations in OPC model calibration

Author
DEPRE, Laurent1 ; CORK, Christopher1 ; DRAPEAU, Martin2
[1] Synopsys SARL, 12 rue Lavoisier, 38330 Montbonnot, France
[2] Synopsys Inc., One Antares Drive, Suite 300, K2E 8C4 Nepean, Ontario, Canada
Conference title
Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
Conference name
Photomask technology (2006)
Author (monograph)
Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63494L.1-63494L.9 ; ref : 2 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
0-8194-6444-9
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Washington
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Ajustement modèle Appareillage essai Masque Pastille électronique Correction optique de proximité
Keyword (en)
Model matching Testing equipment Mask Wafer Optical proximity correction
Keyword (es)
Ajustamiento modelo Aparato ensayo Máscara Pastilla electrónica Corrección de proximidad óptica
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03B Testing, measurement, noise and reliability

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104128

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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