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Efficient approach to improving pattern fidelity with multi OPC model and recipe

Author
DO, Munhoe1 ; KANG, Jaehyun1 ; CHOI, Jaeyoung1 ; LEE, Junseok1 ; LEE, Yongsuk1 ; KIM, Keeho1
[1] RET Team, Advanced Nano-tech Development Division, Dongbu Electronics 474-1, Sangwoo-Ri, Gamgok-Myeon, Eumseong-Gun, Chungbuk, 369-852, Korea, Republic of
Conference title
Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
Conference name
Photomask technology (2006)
Author (monograph)
Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63494P.1-63494P.12 ; ref : 6 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
0-8194-6444-9
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Washington
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Circuit intégré Optimisation Système sur puce Correction optique de proximité
Keyword (en)
Integrated circuit Optimization System on a chip Optical proximity correction
Keyword (es)
Circuito integrado Optimización Sistema sobre pastilla Corrección de proximidad óptica
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104132

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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