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Deep sub-wavelength mask assist features and mask errors printability in high NA lithography

Author
CHENG, Wen-Hao1 ; LEE, Mindy1 2 ; TOLANI, Vikram1 ; NAKAHMA, Mark1 ; GLEASON, Bob1
[1] Intel Corporation, 2200 Mission College Blvd, Santa Clara, California 95054, United States
[2] University of Rochester, Institute of Optics, Rochester, New York 14627, United States
Conference title
Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
Conference name
Photomask technology (2006)
Author (monograph)
Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63494W.1-63494W.7 ; ref : 6 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
0-8194-6444-9
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Washington
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Eclairement Fabrication microélectronique Formation image Imprimabilité Loi échelle Masque Miniaturisation Ouverture numérique Pastille électronique Photolithographie
Keyword (en)
Illumination Microelectronic fabrication Imaging Printability Scaling law Mask Miniaturization Numerical aperture Wafer Photolithography
Keyword (es)
Alumbrado Fabricación microeléctrica Formación imagen Imprimibilidad Ley escala Máscara Miniaturización Abertura numérica Pastilla electrónica Fotolitografía
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104139

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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