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EUV lithography program at IMEC

Author
GOETHALS, Anne Marie1 ; JONCKHEERE, Rik1 ; STEPANENKO, Nikolay7 ; GRONHEID, Roel1 ; BAUDEMPREZ, Bart1 ; RONSE, Kurt1 ; FRANCESCO LORUSSO, Gian1 ; HERMANS, Jan1 ; VAN ROEY, Frieda1 ; MYERS, Alan2 3 ; CHANDHOK, Manish2 ; KIM, Insung4 ; NIROOMAND, Ardavan5 ; IWAMOTO, Fumio6
[1] IMEC, Kapeldreef 75, 3001 Leuven, Belgium
[2] Intel Corp., 222501 NW 229th Ave, Hillsboro, OR97124, United States
[3] Intel Corporation
[4] Samsung Electronics
[5] Micron Technology
[6] Matsushita Electric Industrial Co., Ltd
[7] Qimonda
Conference title
Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
Conference name
Emerging lithographic technologies (11 ; San Jose CA 2007)
Author (monograph)
Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651709.1-651709.12 ; ref : 19 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-6636-5
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham WA
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Article synthèse Evaluation performance Fabrication microélectronique Imprimabilité Lithographie UV Masque Photolithographie Programme recherche Rayonnement UV extrême Résist Scanneur
Keyword (en)
Review Performance evaluation Microelectronic fabrication Printability UV lithography Mask Photolithography Research program Vacuum ultraviolet radiation Resist Scanner
Keyword (es)
Artículo síntesis Evaluación prestación Fabricación microeléctrica Imprimibilidad Litografía UV Máscara Fotolitografía Programa investigación Radiación ultravioleta extrema Resistencia Escáner
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104435

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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