EUV lithography program at IMEC
- Author
- GOETHALS, Anne Marie1 ; JONCKHEERE, Rik1 ; STEPANENKO, Nikolay7 ; GRONHEID, Roel1 ; BAUDEMPREZ, Bart1 ; RONSE, Kurt1 ; FRANCESCO LORUSSO, Gian1 ; HERMANS, Jan1 ; VAN ROEY, Frieda1 ; MYERS, Alan2 3 ; CHANDHOK, Manish2 ; KIM, Insung4 ; NIROOMAND, Ardavan5 ; IWAMOTO, Fumio6
[1] IMEC, Kapeldreef 75, 3001 Leuven, Belgium
[2] Intel Corp., 222501 NW 229th Ave, Hillsboro, OR97124, United States
[3] Intel Corporation
[4] Samsung Electronics
[5] Micron Technology
[6] Matsushita Electric Industrial Co., Ltd
[7] Qimonda - Conference title
- Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
- Conference name
- Emerging lithographic technologies (11 ; San Jose CA 2007)
- Author (monograph)
- Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651709.1-651709.12 ; ref : 19 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6636-5
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham WA
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Article synthèse Evaluation performance Fabrication microélectronique Imprimabilité Lithographie UV Masque Photolithographie Programme recherche Rayonnement UV extrême Résist Scanneur
- Keyword (en)
- Review Performance evaluation Microelectronic fabrication Printability UV lithography Mask Photolithography Research program Vacuum ultraviolet radiation Resist Scanner
- Keyword (es)
- Artículo síntesis Evaluación prestación Fabricación microeléctrica Imprimibilidad Litografía UV Máscara Fotolitografía Programa investigación Radiación ultravioleta extrema Resistencia Escáner
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104435
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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