EUV and non-EUV inspection of reticle defect repair sites
- Author
- GOLDBERG, Kenneth A1 ; BARTY, Anton2 ; SEIDEL, Phillip3 ; EDINGER, Klaus4 ; FETTIG, Rainer4 ; KEARNEY, Patrick5 ; HAN, Hakseung5 ; WOOD, Obert R6
[1] Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, United States
[2] Lawrence Livermore National Laboratory, PO Box 808, Livermore, CA 94550, United States
[3] SEMATECH, 2706 Montopolis Drive, Austin TX 78741, United States
[4] Carl Zeiss SMS, Industriestr. 1, 64380 Rossdorf, Germany
[5] SEMATECH, 255 Fuller Road, Suite 309, Albany, NY 12203, United States
[6] Advanced Micro Devices, 255 Fuller Road, M/S 253, Albany, NY 12203, United States - Conference title
- Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
- Conference name
- Emerging lithographic technologies (11 ; San Jose CA 2007)
- Author (monograph)
- Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65170C.1-65170C.7 ; ref : 16 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6636-5
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham WA
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Etude comparative Fabrication microélectronique Facteur réflexion Lithographie UV Masque Matériau revêtu Microscopie confocale Microscopie force atomique Multicouche Photolithographie Rayonnement UV extrême
- Keyword (en)
- Comparative study Microelectronic fabrication Reflectance UV lithography Mask Coated material Confocal microscopy Atomic force microscopy Multiple layer Photolithography Vacuum ultraviolet radiation
- Keyword (es)
- Estudio comparativo Fabricación microeléctrica Coeficiente reflexión Litografía UV Máscara Material revestido Microscopía confocal Microscopía fuerza atómica Capa múltiple Fotolitografía Radiación ultravioleta extrema
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104438
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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