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Multi-level step and flash imprint lithography for direct patterning of dielectrics

Author
JEN, Wei-Lun1 2 ; PALMIERI, Frank1 ; CHAO, Brook1 ; LIN, Michael1 ; JIANJUN HAO1 ; OWENS, Jordan3 ; SOTOODEH, Ken3 ; CHEUNG, Robin4 ; WILLSON, C. Grant1
[1] The University of Texas at Austin, Austin, TX 78712, United States
[2] Dept. Chemical Engineering, M/S C0400, UT-Austin, Austin, TX 78712, United States
[3] ATDF, Inc., 2706 Montopolis Dr, Austin, TX 78741, United States
[4] Applied Materials, 3050 Bowers Ave, Santa Clara, CA 95054, United States
Conference title
Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
Conference name
Emerging lithographic technologies (11 ; San Jose CA 2007)
Author (monograph)
Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65170K.1-65170K.9 ; ref : 9 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-6636-5
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham WA
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Circuit accordable Circuit intégré Câblage Damasquinage Diélectrique Fabrication microélectronique Formation motif Interconnexion Lithographie Microprocesseur Méthode multipas Pastille électronique Photolithographie Polissage mécanochimique Système n niveaux Technologie tranchée Vitesse gravure
Keyword (en)
Tunable circuit Integrated circuit Wiring Damascene process Dielectric materials Microelectronic fabrication Patterning Interconnection Lithography Microprocessor Multistep method Wafer Photolithography Chemical mechanical polishing Multilevel system Trench technology Etching rate
Keyword (es)
Circuito acordable Circuito integrado Colocación cables Damasquinado Dieléctrico Fabricación microeléctrica Formacíon motivo Interconexión Litografía Microprocesador Método multipaso Pastilla electrónica Fotolitografía Sistema n niveles Tecnología trinchera Velocidad grabado
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06B Integrated circuits by function (including memories and processors)

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104445

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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