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Microdischarge EUV source array and illuminator design for a prototype lithography tool

Author
JURCZYK, B. E1 ; STUBBERS, R. A1 ; ALMAN, D. A1 ; HUDYMA, R2 ; THOMAS, M2
[1] Starfire Industries LLC, 60 Hazelwood Drive, Champaign, IL 61820, United States
[2] Hyperion Development LLC, 218 East Ridge Drive, San Ramon, CA, 94582, United States
Conference title
Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
Conference name
Emerging lithographic technologies (11 ; San Jose CA 2007)
Author (monograph)
Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65170T.1-65170T.8 ; ref : 5 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-6636-5
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham WA
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Appareil éclairage Architecture réseau Charge thermique Cohérence partielle Diagnostic plasma Eclairement Elément optique Evaluation performance Extensibilité Fabrication microélectronique Fiabilité Instrument optique Lentille oeil mouche Lithographie Masque Multiplexage spatial Prototype Rayonnement UV extrême Source lumineuse Source plasma Taux conversion 4272
Keyword (en)
Lighting fitting Network architecture Thermal load Partial coherence Plasma diagnostic Illumination Optical elements Performance evaluation Scalability Microelectronic fabrication Reliability Optical instrument Fly eye lens Lithography Mask Spatial multiplexing Prototype Vacuum ultraviolet radiation Light source Plasma sources Conversion rate
Keyword (es)
Aparato alumbrado Arquitectura red Carga térmica Coherencia parcial Diagnóstico plasma Alumbrado Evaluación prestación Estensibilidad Fabricación microeléctrica Fiabilidad Instrumento óptico Lente ojo mosca Litografía Máscara Multiplaje espacial Prototipo Radiación ultravioleta extrema Fuente luminosa Factor conversión
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B72 Optical sources and standards

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics Physics : optics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104452

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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