Alignment method of low-energy electron-beam direct writing system EBIS using voltage contrast image
- Author
- KOSHIBA, Takeshi1 ; OTA, Takumi1 ; NAKASUGI, Tetsuro1 ; NAKAMURA, Fumihiko2 ; WATANABE, Katsuhide2 ; SUGIHARA, Kazuyoshi2
[1] Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation, 8, Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
[2] Engineering Dept., e-BEAM Corporation, Konan Park Bldg. 2-12-26 Konan, Minato-ku, Tokyo 108-0075, Japan - Conference title
- Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
- Conference name
- Emerging lithographic technologies (11 ; San Jose CA 2007)
- Author (monograph)
- Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651713.1-651713.12 ; ref : 5 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6636-5
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham WA
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Contraste image Couche épaisse Diffusion onde Dispositif logique Diélectrique Ecriture faisceau électronique Effet proximité Electronique faible puissance Fabrication microélectronique Faisceau électronique Résist Rétrodiffusion Système intégré
- Keyword (en)
- Image contrast Thick film Wave scattering Logic devices Dielectric materials Electron beam writing Proximity effect Low-power electronics Microelectronic fabrication Electron beam Resist Backscattering Integrated system
- Keyword (es)
- Imagen contraste Capa espesa Difusión onda Dieléctrico Escritura haz electrónico Efecto proximidad Fabricación microeléctrica Haz electrónico Resistencia Retrodifusión Sistema integrado
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104462
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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