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Alignment method of low-energy electron-beam direct writing system EBIS using voltage contrast image

Author
KOSHIBA, Takeshi1 ; OTA, Takumi1 ; NAKASUGI, Tetsuro1 ; NAKAMURA, Fumihiko2 ; WATANABE, Katsuhide2 ; SUGIHARA, Kazuyoshi2
[1] Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation, 8, Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
[2] Engineering Dept., e-BEAM Corporation, Konan Park Bldg. 2-12-26 Konan, Minato-ku, Tokyo 108-0075, Japan
Conference title
Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
Conference name
Emerging lithographic technologies (11 ; San Jose CA 2007)
Author (monograph)
Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651713.1-651713.12 ; ref : 5 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-6636-5
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham WA
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Contraste image Couche épaisse Diffusion onde Dispositif logique Diélectrique Ecriture faisceau électronique Effet proximité Electronique faible puissance Fabrication microélectronique Faisceau électronique Résist Rétrodiffusion Système intégré
Keyword (en)
Image contrast Thick film Wave scattering Logic devices Dielectric materials Electron beam writing Proximity effect Low-power electronics Microelectronic fabrication Electron beam Resist Backscattering Integrated system
Keyword (es)
Imagen contraste Capa espesa Difusión onda Dieléctrico Escritura haz electrónico Efecto proximidad Fabricación microeléctrica Haz electrónico Resistencia Retrodifusión Sistema integrado
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104462

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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