Focused Ion Beam nano patterning for fabrications of III-Nitride light emitting diodes
- Author
- KIM, M. Y1 ; PARK, Y. C1 ; HONG, S. S1 ; KIM, B. K1 ; KIM, D. W2 ; LEE, D. Y2
[1] Samsung Electro-Mechanics AE group, 314, Maetan-3-dong, Young-Tong-Ku, Suwon, Kyung-kido, 442-743, Korea, Republic of
[2] Samsung Electro-Mechanics Lighting Module group, 314, Maetan-3-dong, Young-Tong-Ku, Suwon, Kyung-ki-do, 442-743, Korea, Republic of - Conference title
- Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
- Conference name
- Emerging lithographic technologies (11 ; San Jose CA 2007)
- Author (monograph)
- Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65171M.1-65171M.6 ; ref : 7 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6636-5
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham WA
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Brillance Composé III-V Couche mince Diode électroluminescente Dispositif optoélectronique Dépôt phase vapeur Endommagement Fabrication microélectronique Gravure faisceau ionique Implantation ion Lithographie faisceau électron Méthode MOCVD Nanolithographie Nanostructure Nanotechnologie Optique intégrée Pastille électronique Procédé voie humide Pulvérisation faisceau ionique Technologie MESA Technologie faisceau ion focalisé
- Keyword (en)
- Brightness III-V compound Thin film Light emitting diode Optoelectronic device Vapor deposition Damaging Microelectronic fabrication Ion beam etching Ion implantation Electron beam lithography MOCVD Nanolithography Nanostructure Nanotechnology Integrated optics Wafer Wet process Ion beam sputtering MESA technology Focused ion beam technology
- Keyword (es)
- Brillantez Compuesto III-V Capa fina Diodo electroluminescente Dispositivo optoelectrónico Depósito fase vapor Deterioración Fabricación microeléctrica Grabado haz iónico Implantación ión Litografía haz electrón Nanoestructura Nanotecnología Optica integrada Pastilla electrónica Procedimiento vía húmeda Pulverización haz iónico Tecnología MESA
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F15 Optoelectronic devices
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03G Electric, optical and optoelectronic circuits / 001D03G02 Circuit properties / 001D03G02C Optical and optoelectronic circuits / 001D03G02C1 Integrated optics. Optical fibers and wave guides
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104475
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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