Energetic and thermal Sn interactions and their effect on EUVL source collector mirror lifetime at high temperatures
- Author
- ALLAIN, J. P1 ; NIETO, M1 ; HENDRICKS, M1 ; HASSANEIN, A1 ; TARRIO, C2 ; GRANTHAM, S2 ; BAKSHI, V3
[1] Argonne National Laboratory, Argonne, Illinois, United States
[2] National Institute of Standards and Technology, Gaithersburg, Maryland, United States
[3] Sematech, Austin, Texas, United States - Conference title
- Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
- Conference name
- Emerging lithographic technologies (11 ; San Jose CA 2007)
- Author (monograph)
- Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65171V.1-65171V.10 ; ref : 8 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6636-5
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham WA
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Collecteur Diffusion ion Durabilité Electronique faible puissance Etat actuel Evaluation performance Fabrication microélectronique Facteur réflexion Fiabilité In situ Irradiation ion Lithographie UV Particule chargée Photolithographie Plasma dense Propriété surface Rayonnement UV extrême Réflectométrie Source lumineuse Spectre photoélectron RX Structure surface 4272
- Keyword (en)
- Collector Ion scattering Durability Low-power electronics State of the art Performance evaluation Microelectronic fabrication Reflectance Reliability In situ Ion irradiation UV lithography Charged particle Photolithography Dense plasma Surface properties Vacuum ultraviolet radiation Reflectometry Light source X-ray photoelectron spectra Surface structure
- Keyword (es)
- Colector Difusión ión Durabilidad Estado actual Evaluación prestación Fabricación microeléctrica Coeficiente reflexión Fiabilidad In situ Irradiación ión Litografía UV Partícula cargada Fotolitografía Plasma denso Propiedad superficie Radiación ultravioleta extrema Reflectometría Fuente luminosa Estructura superficie
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B72 Optical sources and standards
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics Physics : optics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104481
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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