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Detection signal analysis of actinic inspection of EUV mask blanks using dark-field imaging

Author
TANAKA, Toshihiko1 ; TERASAWA, Tsuneo1 ; IRIKI, Nobuyuki2 ; AOYAMA, Hajime1 ; TOMIE, Toshihisa3
[1] MIRAI-Selete, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan
[2] Selete, Onogawa 16-1, Tsukuba, Ibaraki 305-8569, Japan
[3] AIST, Tsukuba Central 2, Tsukuba, Ibaraki 305-8568, Japan
Conference title
Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
Conference name
Emerging lithographic technologies (11 ; San Jose CA 2007)
Author (monograph)
Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65171Y.1-65171Y.11 ; ref : 14 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-6636-5
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham WA
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Analyse signal Fabrication microélectronique Formation image Implémentation Imprimabilité Lithographie UV Masque Matériau revêtu Multicouche Ouverture numérique Photolithographie Rayonnement UV extrême Traitement signal
Keyword (en)
Signal analysis Microelectronic fabrication Imaging Implementation Printability UV lithography Mask Coated material Multiple layer Numerical aperture Photolithography Vacuum ultraviolet radiation Signal processing
Keyword (es)
Análisis de señal Fabricación microeléctrica Formación imagen Implementación Imprimibilidad Litografía UV Máscara Material revestido Capa múltiple Abertura numérica Fotolitografía Radiación ultravioleta extrema Procesamiento señal
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104484

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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