Low viscosity and fast curing polymer system for UV-based nanoimprint lithography and its processing
- Author
- VOGLER, Marko1 ; BENDER, Markus2 ; PLACHETKA, Ulrich2 ; FUCHS, Andreas2 ; WIEDENBERG, Sabine1 ; REUTHER, Freimut1 ; GRÜTZNER, Gabi1 ; KURZ, Heinrich2
[1] micro resist technology GmbH, Köpenicker StraBe 325, 12555 Berlin, Germany
[2] AMO GmbH, Otto-Blumenthal-Strasse 25, 52074 Aachen, Germany - Conference title
- Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
- Conference name
- Emerging lithographic technologies (11 ; San Jose CA 2007)
- Author (monograph)
- Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651727.1-651727.11 ; ref : 17 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6636-5
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham WA
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Durcissement irradiation Débit dose Fabrication microélectronique Formation motif Gravure plasma Haute performance Lithographie UV Nanolithographie Pastille électronique Photolithographie Polymère Procédé fabrication Production industrielle Rayonnement UV Revêtement centrifugation Résist Temps exécution Vitesse gravure
- Keyword (en)
- Radiation hardening Dose rate Microelectronic fabrication Patterning Plasma etching High performance UV lithography Nanolithography Wafer Photolithography Polymer Manufacturing process Industrial production Ultraviolet radiation Spin-on coatings Resist Execution time Etching rate
- Keyword (es)
- Flujo dosis Fabricación microeléctrica Formacíon motivo Grabado plasma Alto rendimiento Litografía UV Pastilla electrónica Fotolitografía Polímero Procedimiento fabricación Producción industrial Radiación ultravioleta Resistencia Tiempo ejecución Velocidad grabado
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104493
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Install on your browser
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:0:\"\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:100:\"Low viscosity and fast curing polymer system for UV-based nanoimprint lithography and its processing\";s:9:\"\u0000*\u0000jtitle\";s:70:\"Proceedings of SPIE, the International Society for Optical Engineering\";s:9:\"\u0000*\u0000stitle\";s:29:\"Proc. SPIE Int. Soc. Opt. Eng\";s:7:\"\u0000*\u0000date\";s:4:\"2007\";s:9:\"\u0000*\u0000volume\";s:0:\"\";s:8:\"\u0000*\u0000issue\";s:0:\"\";s:8:\"\u0000*\u0000spage\";s:8:\"651727.1\";s:8:\"\u0000*\u0000epage\";s:9:\"651727.11\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0277-786X\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"VOGLER\";s:10:\"\u0000*\u0000aufirst\";s:5:\"Marko\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:14:\"BENDER, Markus\";i:1;s:17:\"PLACHETKA, Ulrich\";i:2;s:14:\"FUCHS, Andreas\";i:3;s:18:\"WIEDENBERG, Sabine\";i:4;s:16:\"REUTHER, Freimut\";i:5;s:15:\"GR\u00dcTZNER, Gabi\";i:6;s:14:\"KURZ, Heinrich\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:17:\"978-0-8194-6636-5\";s:8:\"\u0000*\u0000coden\";s:6:\"PSISDG\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:92:\"Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)\";s:8:\"\u0000*\u0000title\";s:100:\"Low viscosity and fast curing polymer system for UV-based nanoimprint lithography and its processing\";s:8:\"\u0000*\u0000place\";s:13:\"Bellingham WA\";s:6:\"\u0000*\u0000pub\";s:4:\"SPIE\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:0:\"\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:100:\"Low viscosity and fast curing polymer system for UV-based nanoimprint lithography and its processing\";s:9:\"\u0000*\u0000jtitle\";s:70:\"Proceedings of SPIE, the International Society for Optical Engineering\";s:9:\"\u0000*\u0000stitle\";s:29:\"Proc. SPIE Int. Soc. Opt. Eng\";s:7:\"\u0000*\u0000date\";s:4:\"2007\";s:9:\"\u0000*\u0000volume\";s:0:\"\";s:8:\"\u0000*\u0000issue\";s:0:\"\";s:8:\"\u0000*\u0000spage\";s:8:\"651727.1\";s:8:\"\u0000*\u0000epage\";s:9:\"651727.11\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0277-786X\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"VOGLER\";s:10:\"\u0000*\u0000aufirst\";s:5:\"Marko\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:14:\"BENDER, Markus\";i:1;s:17:\"PLACHETKA, Ulrich\";i:2;s:14:\"FUCHS, Andreas\";i:3;s:18:\"WIEDENBERG, Sabine\";i:4;s:16:\"REUTHER, Freimut\";i:5;s:15:\"GR\u00dcTZNER, Gabi\";i:6;s:14:\"KURZ, Heinrich\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:17:\"978-0-8194-6636-5\";s:8:\"\u0000*\u0000coden\";s:6:\"PSISDG\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:92:\"Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)\";s:8:\"\u0000*\u0000title\";s:100:\"Low viscosity and fast curing polymer system for UV-based nanoimprint lithography and its processing\";s:8:\"\u0000*\u0000place\";s:13:\"Bellingham WA\";s:6:\"\u0000*\u0000pub\";s:4:\"SPIE\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:0:\"\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:100:\"Low viscosity and fast curing polymer system for UV-based nanoimprint lithography and its processing\";s:9:\"\u0000*\u0000jtitle\";s:70:\"Proceedings of SPIE, the International Society for Optical Engineering\";s:9:\"\u0000*\u0000stitle\";s:29:\"Proc. SPIE Int. Soc. Opt. Eng\";s:7:\"\u0000*\u0000date\";s:4:\"2007\";s:9:\"\u0000*\u0000volume\";s:0:\"\";s:8:\"\u0000*\u0000issue\";s:0:\"\";s:8:\"\u0000*\u0000spage\";s:8:\"651727.1\";s:8:\"\u0000*\u0000epage\";s:9:\"651727.11\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0277-786X\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"VOGLER\";s:10:\"\u0000*\u0000aufirst\";s:5:\"Marko\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:14:\"BENDER, Markus\";i:1;s:17:\"PLACHETKA, Ulrich\";i:2;s:14:\"FUCHS, Andreas\";i:3;s:18:\"WIEDENBERG, Sabine\";i:4;s:16:\"REUTHER, Freimut\";i:5;s:15:\"GR\u00dcTZNER, Gabi\";i:6;s:14:\"KURZ, Heinrich\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:17:\"978-0-8194-6636-5\";s:8:\"\u0000*\u0000coden\";s:6:\"PSISDG\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:92:\"Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)\";s:8:\"\u0000*\u0000title\";s:100:\"Low viscosity and fast curing polymer system for UV-based nanoimprint lithography and its processing\";s:8:\"\u0000*\u0000place\";s:13:\"Bellingham WA\";s:6:\"\u0000*\u0000pub\";s:4:\"SPIE\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:0:\"\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:100:\"Low viscosity and fast curing polymer system for UV-based nanoimprint lithography and its processing\";s:9:\"\u0000*\u0000jtitle\";s:70:\"Proceedings of SPIE, the International Society for Optical Engineering\";s:9:\"\u0000*\u0000stitle\";s:29:\"Proc. SPIE Int. Soc. Opt. Eng\";s:7:\"\u0000*\u0000date\";s:4:\"2007\";s:9:\"\u0000*\u0000volume\";s:0:\"\";s:8:\"\u0000*\u0000issue\";s:0:\"\";s:8:\"\u0000*\u0000spage\";s:8:\"651727.1\";s:8:\"\u0000*\u0000epage\";s:9:\"651727.11\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0277-786X\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"VOGLER\";s:10:\"\u0000*\u0000aufirst\";s:5:\"Marko\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:14:\"BENDER, Markus\";i:1;s:17:\"PLACHETKA, Ulrich\";i:2;s:14:\"FUCHS, Andreas\";i:3;s:18:\"WIEDENBERG, Sabine\";i:4;s:16:\"REUTHER, Freimut\";i:5;s:15:\"GR\u00dcTZNER, Gabi\";i:6;s:14:\"KURZ, Heinrich\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:17:\"978-0-8194-6636-5\";s:8:\"\u0000*\u0000coden\";s:6:\"PSISDG\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:92:\"Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)\";s:8:\"\u0000*\u0000title\";s:100:\"Low viscosity and fast curing polymer system for UV-based nanoimprint lithography and its processing\";s:8:\"\u0000*\u0000place\";s:13:\"Bellingham WA\";s:6:\"\u0000*\u0000pub\";s:4:\"SPIE\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:0:\"\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:100:\"Low viscosity and fast curing polymer system for UV-based nanoimprint lithography and its processing\";s:9:\"\u0000*\u0000jtitle\";s:70:\"Proceedings of SPIE, the International Society for Optical Engineering\";s:9:\"\u0000*\u0000stitle\";s:29:\"Proc. SPIE Int. Soc. Opt. Eng\";s:7:\"\u0000*\u0000date\";s:4:\"2007\";s:9:\"\u0000*\u0000volume\";s:0:\"\";s:8:\"\u0000*\u0000issue\";s:0:\"\";s:8:\"\u0000*\u0000spage\";s:8:\"651727.1\";s:8:\"\u0000*\u0000epage\";s:9:\"651727.11\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0277-786X\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"VOGLER\";s:10:\"\u0000*\u0000aufirst\";s:5:\"Marko\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:14:\"BENDER, Markus\";i:1;s:17:\"PLACHETKA, Ulrich\";i:2;s:14:\"FUCHS, Andreas\";i:3;s:18:\"WIEDENBERG, Sabine\";i:4;s:16:\"REUTHER, Freimut\";i:5;s:15:\"GR\u00dcTZNER, Gabi\";i:6;s:14:\"KURZ, Heinrich\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:17:\"978-0-8194-6636-5\";s:8:\"\u0000*\u0000coden\";s:6:\"PSISDG\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:92:\"Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)\";s:8:\"\u0000*\u0000title\";s:100:\"Low viscosity and fast curing polymer system for UV-based nanoimprint lithography and its processing\";s:8:\"\u0000*\u0000place\";s:13:\"Bellingham WA\";s:6:\"\u0000*\u0000pub\";s:4:\"SPIE\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
arXiv access
