Nanoimprinting with SU-8 epoxy resists
- Author
- JOHNSON, Donald W1 ; MILLER, Harris1 ; KUBENZ, Mike2 ; REUTHER, Freimut2 ; GRUETZNER, Gabi2
[1] MicroChem Corp., 1254 Chestnut St, Newton, MA 02464, United States
[2] micro resist technology GmbH, Koepenicker Str. 325, 12555 Berlin, Germany - Conference title
- Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
- Conference name
- Emerging lithographic technologies (11 ; San Jose CA 2007)
- Author (monograph)
- Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65172A.1-65172A.8 ; ref : 4 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6636-5
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham WA
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Contrainte thermique Cycle thermique Durcissement Déformation Fabrication microélectronique Lithographie UV Nanolithographie Pastille électronique Photolithographie Revêtement centrifugation Résist Temps exécution
- Keyword (en)
- Thermal stress Thermal cycle Hardening Deformation Microelectronic fabrication UV lithography Nanolithography Wafer Photolithography Spin-on coatings Resist Execution time
- Keyword (es)
- Tensión térmica Ciclo térmico Endurecimiento Deformación Fabricación microeléctrica Litografía UV Pastilla electrónica Fotolitografía Resistencia Tiempo ejecución
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104495
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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