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Process window study with various illuminations for EUV lithography applications

Author
SANG HUN LEE1 ; ZHIYU ZHANG1
[1] Intel Corporation, 2200 Mission College Boulevard, Santa Clara, CA 95054, United States
Conference title
Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
Conference name
Emerging lithographic technologies (11 ; San Jose CA 2007)
Author (monograph)
Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65172P.1-65172P.8 ; ref : 14 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-6636-5
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham WA
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Cohérence partielle Dipôle Eclairement Etude comparative Fabrication microélectronique Imageur Lithographie UV Modélisation Photolithographie Rayonnement UV extrême Résist Source lumineuse 4272
Keyword (en)
Partial coherence Dipole Illumination Comparative study Microelectronic fabrication Imager UV lithography Modeling Photolithography Vacuum ultraviolet radiation Resist Light source
Keyword (es)
Coherencia parcial Dipolo Alumbrado Estudio comparativo Fabricación microeléctrica Imager Litografía UV Modelización Fotolitografía Radiación ultravioleta extrema Resistencia Fuente luminosa
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B72 Optical sources and standards

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics Physics : optics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104509

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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