Characteristics and prevention of pattern collapse in EUV lithography
- Author
- CHANG, Wook1 ; KIM, Eun-Jin1 ; KANG, Young-Min1 ; PARK, Seung-Wook1 ; LIM, Chang-Moon2 ; WON, Ki-Tak3 ; KIM, Jai-Soon3 ; OH, Hye-Keun1
[1] Department of Applied Physics, Hanyang University, Ansan, 426-791, Korea, Republic of
[2] Hynix Semiconductor Inc, Icheon, 467-701, Korea, Republic of
[3] Seoul National University, Seoul 151-747, Korea, Republic of - Conference title
- Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
- Conference name
- Emerging lithographic technologies (11 ; San Jose CA 2007)
- Author (monograph)
- Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65172S.1-65172S.7 ; ref : 2 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6636-5
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham WA
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Fabrication microélectronique Force adhérence Largeur raie Lithographie UV Photolithographie Photorésist Rapport aspect Rayonnement UV extrême Résist
- Keyword (en)
- Microelectronic fabrication Adhesive strength Line width UV lithography Photolithography Photoresist Aspect ratio Vacuum ultraviolet radiation Resist
- Keyword (es)
- Fabricación microeléctrica Fuerza adherencia Anchura raya espectral Litografía UV Fotolitografía Fotorresistencia Relación dimensional Radiación ultravioleta extrema Resistencia
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104510
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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