Polarization dependence of multilayer reflectance in the EUV spectral range
- Author
- SCHOLZE, Frank1 ; LAUBIS, Christian1 ; BUCHHOLZ, Christian1 ; FISCHER, Andreas1 ; KAMPE, Annett1 ; PLÖGER, Sven1 ; SCHOLZ, Frank1 ; ULM, Gerhard1
[1] Physikalisch-Technische Bundesanstalt, AbbestraBe 2-12, 10587 Berlin, Germany - Conference title
- Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
- Conference name
- Emerging lithographic technologies (11 ; San Jose CA 2007)
- Author (monograph)
- Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65172W.1-65172W.9 ; ref : 11 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6636-5
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham WA
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Angle incidence Anneau stockage Codage Composant optique Distorsion intermodulation Fabrication microélectronique Facteur réflexion Lithographie UV Multicouche Méthode mesure Photolithographie Polarisation rectiligne Rayonnement UV extrême Rayonnement polarisé Reproductibilité Revêtement multicouche Réflectométrie Répétabilité Résolution spatiale 2920D
- Keyword (en)
- Angle of incidence Storage ring Coding Optical component Intermodulation distortion Microelectronic fabrication Reflectance UV lithography Multiple layer Measurement method Photolithography Rectilinear polarization Vacuum ultraviolet radiation Polarized radiation Reproducibility Multilayer coating Reflectometry Repeatability Spatial resolution
- Keyword (es)
- Angulo incidente Anillo almacenaje Codificación Componente óptico Fabricación microeléctrica Coeficiente reflexión Litografía UV Capa múltiple Método medida Fotolitografía Polarización rectilínea Radiación ultravioleta extrema Radiación polarizada Reproductividad Revestimiento multicapa Reflectometría Repetibilidad Resolución espacial
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B20 Nuclear physics / 001B20I Experimental methods and instrumentation for elementary-particle and nuclear physics / 001B20I20 Cyclic accelerators and storage rings / 001B20I20D Storage rings
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics Nuclear physics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104513
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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