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Long-term durability of a Ru capping layer for EUVL projection optics by introducing ethanol

Author
KAKUTANI, Yukinobu1 ; NIIBE, Masahito1 ; GOMEI, Yoshio2 ; TAKASE, Hiromitsu3 ; TERASHIMA, Shigeru3 ; MATSUNARI, Shuichi3 ; AOKI, Takashi3 ; FUKUDA, Yasuaki3
[1] Laboratory of Advanced Science and Technology for Industry (LASTI), University of Hyogo, 3-1-2 Kouto, Kamigori-cho, Ako-gun, Hyogo 678-1205, Japan
[2] Canon Inc., 23-10, Kiyohara-Kogyodanchi, Utsunomiya-shi, Tochigi 321-3298, Japan
[3] Extreme Ultraviolet Lithography System Development Association (EUVA), 11th Floor, Kawasaki East One Building 11-1 Ekimae-honcho, Kawasaki-ku, Kawasaki-shi, Kanagawa 210-0007, Japan
Conference title
Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
Conference name
Emerging lithographic technologies (11 ; San Jose CA 2007)
Author (monograph)
Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651731.1-651731.11 ; ref : 10 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-6636-5
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham WA
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Durabilité Endommagement Fabrication microélectronique Facteur réflexion Fiabilité Lithographie UV Multicouche Photolithographie Pression partielle Rayonnement UV extrême Revêtement
Keyword (en)
Durability Damaging Microelectronic fabrication Reflectance Reliability UV lithography Multiple layer Photolithography Partial pressure Vacuum ultraviolet radiation Coatings
Keyword (es)
Durabilidad Deterioración Fabricación microeléctrica Coeficiente reflexión Fiabilidad Litografía UV Capa múltiple Fotolitografía Presión parcial Radiación ultravioleta extrema Revestimiento
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104518

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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