Experimental results for an addressable xenon microdischarge EUV source array for HVM lithography
- Author
- JURCZYK, Brian1 ; STUBBERS, Robert1 ; ALMAN, Darren A1 ; ROVEY, Josh L1 ; COVENTRY, Matthew D1
[1] Starfire Industries LLC, Champaign, IL, United States - Conference title
- Emerging lithographic technologies XI (27 February- 1 March 2007, San Jose, California, USA)
- Conference name
- Emerging lithographic technologies (11 ; San Jose CA 2007)
- Author (monograph)
- Lercel, Michael James (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH, Inc, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65173G.1-65173G.9 ; ref : 4 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6636-5
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham WA
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Appareil éclairage Brillance Charge thermique Cohérence partielle Diagnostic plasma Eclairement Evaluation performance Fabrication microélectronique Fiabilité Gestion température packaging électronique Instrument optique Lentille oeil mouche Lithographie Pureté spectrale Rayonnement UV extrême Source lumineuse Système refroidissement Taux conversion 4272
- Keyword (en)
- Lighting fitting Brightness Thermal load Partial coherence Plasma diagnostic Illumination Performance evaluation Microelectronic fabrication Reliability Thermal management (packaging) Optical instrument Fly eye lens Lithography Spectral purity Vacuum ultraviolet radiation Light source Cooling system Conversion rate
- Keyword (es)
- Aparato alumbrado Brillantez Carga térmica Coherencia parcial Diagnóstico plasma Alumbrado Evaluación prestación Fabricación microeléctrica Fiabilidad Instrumento óptico Lente ojo mosca Litografía Pureza espectral Radiación ultravioleta extrema Fuente luminosa Sistema enfriamiento Factor conversión
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B72 Optical sources and standards
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics Physics : optics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104528
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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