Comparing ICP and ECR etching of HgCdTe, CdZnTe, and CdTe
- Author
- STOLTZ, A. J1 ; VARESI, J. B1 ; BENSON, J. D1
[1] US Army RDECOM CERDEC Night Vision and Electronic Sensors Directorate, Ft Belvoir, VA, United States - Conference title
- 2006 U.S. Workshop on the Physics and Chemistry of II-VI Materials
- Conference name
- U.S. Workshop on the Physics and Chemistry of II-VI Materials (25 ; Newport Beach, CA 2006-10-10)
- Author (monograph)
- SIVANANTHAN, S (Editor); DHAR, N. K (Editor)
American Physical Society, United States (Organiser of meeting) - Source
Journal of electronic materials. 2007, Vol 36, Num 8, pp 1007-1012, 6 p ; ref : 14 ref
- CODEN
- JECMA5
- ISSN
- 0361-5235
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Institute of Electrical and Electronics Engineers, New York, NY
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Author keyword
- Inductively coupled plasma (ICP) cadmium telluride (CdTe) electron cyclotron resonance (ECR) mercury cadmium telluride (HgCdTe) plasma
- Keyword (fr)
- Cadmium tellurure Fabrication microélectronique Gravure plasma Ionisation Mercure tellurure Microstructure Morphologie Photodétecteur Plasma couplé inductivement Rugosité Résonance cyclotronique électronique Semiconducteur II-VI Sélectivité Tellure Traitement matériau Traitement par plasma Vitesse gravure Zinc tellurure 5277B 6860B 8540H 8560G CdTe CdZnTe HgCdTe Te
- Keyword (en)
- Cadmium tellurides Microelectronic fabrication Plasma etching Ionization Mercury tellurides Microstructure Morphology Photodetectors Inductively coupled plasma Roughness Electron cyclotron-resonance II-VI semiconductors Selectivity Tellurium Material processing Plasma assisted processing Etching rate Zinc tellurides
- Keyword (es)
- Fabricación microeléctrica Grabado plasma Selectividad Tratamiento material Velocidad grabado
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications / 001B50B77B Etching and cleaning
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic / 001B60H60B Mechanical and acoustical properties
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F15 Optoelectronic devices
- Discipline
- Electronics Physics of condensed state : structure, mechanical and thermal properties Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19110477
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1007/s11664-007-0163-z 
https://dx.doi.org/10.1007/s11664-007-0163-z
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