Optical investigation of residual doping species in 6H and 4H-SiC layers grown by chemical vapor deposition
- Author
- NEYRET, E1 2 ; FERRO, G2 ; JUILLAGUET, S1 ; BLUET, J. M2 3 ; JAUSSAUD, C2 ; CAMASSEL, J1
[1] Groupe d'Etude des Semiconducteurs, UM2-CNRS, cc074, 34095 Montpellier, France
[2] LETI-CEA, Département de Microtechnologie, 17 rue des Martyrs, 38054 Grenoble, France
[3] LMGP-ENSPG, Domaine Universitaire, 38054 St Martin d'Hères, France - Conference title
- 2nd European Conference on Silicon Carbide and Related Materials, September 2-4, 1998, Montpellier, France
- Conference name
- ECSCRM'98: European Conference on Silicon Carbide and Related Materials (2 ; Montpellier 1998-09-02)
- Author (monograph)
- CAMASSEL, J (Editor); CONTRERAS, S (Editor); ROBERT, J. L (Editor)
- Source
Materials science & engineering. B, Solid-state materials for advanced technology. 1999, Vol 61-62, pp 253-257 ; ref : 12 ref
- ISSN
- 0921-5107
- Scientific domain
- Chemical industry parachemical industry; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Contamination Couche mince Dopage Dépôt chimique phase vapeur Etude expérimentale Impureté résiduelle Matériau semiconducteur Mode opératoire Photoluminescence Silicium carbure C Si SiC Composé minéral
- Keyword (en)
- Contamination Thin films Doping CVD Experimental study Residual impurity Semiconductor materials Operating mode Photoluminescence Silicon carbides Inorganic compounds
- Keyword (es)
- Doping Impureza residual Método operatorio
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography / 001B60A72 Defects and impurities in crystals; microstructure / 001B60A72W Doping and impurity implantation in other materials
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 1912441
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0921-5107(98)00513-3 
https://dx.doi.org/10.1016/S0921-5107(98)00513-3
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