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Modified polymer architecture for immersion lithography

Author
SANG SOO KIM1 ; JEONG WOO KIM1 ; CHEOL KYU BOK2 ; MOON, Seung-Chan2 ; JUNG YOUL LEE1 ; SEUNG KEUN OH1 ; SANG HYANG LEE1 ; JUNG WOO KIM1 ; JAE WOO LEE1 ; DEOG BAE KIM1 ; KIM, Jaehyun1 ; KEUN DO BAN2
[1] Semiconductor Process Materials Division, Dongjin Semichem. Co., Ltd., 625-3, Yodang-Ri, Yanggam-Myun, Hwasung-Si, Kyungki-Do 445-930, Korea, Republic of
[2] Memory R&D Division, Hynix Semiconductor Co., Ltd., San 136-1, Ami-ri, Bubal-eub, Ichon-si, Kyungki-Do, 467-701, Korea, Republic of
Conference title
Advances in resist materials and processing technology XXIV (26-28 February, 2007, San Jose, California, USA)
Conference name
Advances in resist materials and processing technology (14 ; San Jose Ca 2007)
Author (monograph)
Lin, Qinghuang (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65191W.1-65191W.12 ; ref : 30 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-6638-9
Scientific domain
Electronics; Optics; Physics; Polymers, paint and wood industries
Publisher
SPIE, Bellingham, Wash
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Electronique moléculaire Fabrication microélectronique Haute résolution Hydrophilie Largeur raie Lithographie Miniaturisation Mouillabilité Méthode immersion Nanoélectronique Photolithographie Polymère Radical libre Rugosité Résist
Keyword (en)
Molecular electronics Microelectronic fabrication High resolution Hydrophily Line width Lithography Miniaturization Wettability Immersion method Nanoelectronics Photolithography Polymer Free radical Roughness Resist
Keyword (es)
Electrónica molecular Fabricación microeléctrica Alta resolucion Hidrofilia Anchura raya espectral Litografía Miniaturización Remojabilidad Método immersión Nanoelectrónica Fotolitografía Polímero Radical libre Rugosidad Resistencia
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F18 Molecular electronics, nanoelectronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19224801

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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