Initial process evaluation for next generation immersion technology node
- Author
- TOMITA, Tadatoshi1 ; NAFUS, Kathleen1 ; DE GROOT, Casper3 ; MOERMAN, Richard3 ; HATAKEYAMA, Shinichi1 ; KOSUGI, Hitoshi1 ; ENOMOTO, Masashi1 ; INOUE, Shin2 ; RUCK, Kirsten2 ; WEICHERT, Heiko2 ; MANTECON, Mireia Blanco3 ; STEGEN, Raf3
[1] Toyko Electron Kyshu Limited, 1-1 Fukuhara, Koshi-machi, Kikuchi-gun, Kumamoto 861-1116, Japan
[2] Tokyo Electron Europe, Moritzburger Weg 67 Haus, 01109 Dresden, Germany
[3] ASML Netherlands B.V.De Run 6501, 5504 DR Veldhoven, Netherlands - Conference title
- Advances in resist materials and processing technology XXIV (26-28 February, 2007, San Jose, California, USA)
- Conference name
- Advances in resist materials and processing technology (14 ; San Jose Ca 2007)
- Author (monograph)
- Lin, Qinghuang (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65192B.1-65192B.10 ; ref : 3 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6638-9
- Scientific domain
- Electronics; Optics; Physics; Polymers, paint and wood industries
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Evaluation performance Fabrication microélectronique Lithographie Loi Pareto Méthode mesure Plan expérience Taille critique
- Keyword (en)
- Performance evaluation Microelectronic fabrication Lithography Pareto distribution Measurement method Experimental design Critical size
- Keyword (es)
- Evaluación prestación Fabricación microeléctrica Litografía Ley Pareto Método medida Plan experiencia
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19224816
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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