Molecular contamination control technologies for high volume production phase in high NA 193nm lithography
- Author
- NAKANO, Toshiro1 ; TANAHASHI, Takashi1 ; IMAI, Akihiro1 ; YAMANA, Kazuki1 ; SHIMOTSU, Tainen1 ; TAKAHASHI, Nobuhiro2 ; SHIOGUCHI, Masaharu3 ; MATSUDA, Yoshitaka1 ; KITANO, Junichi3
[1] Nichias Corporarion, 1-70 Daikokucyo, Tsurumiku, Yokohama, Kanagawa-ken, 230-0053, Japan
[2] Tokyo Electron AT Limited, 650 Mitsuzawa, Hosakacho, Nirasaki, Yamanashi-ken, 407-0192, Japan
[3] Tokyo Electron Kyushu Limited, 1-1 Fukuhara, Koushi-shi, Kumamoto-ken, 869-1116, Japan - Conference title
- Advances in resist materials and processing technology XXIV (26-28 February, 2007, San Jose, California, USA)
- Conference name
- Advances in resist materials and processing technology (14 ; San Jose Ca 2007)
- Author (monograph)
- Lin, Qinghuang (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65193I.1-65193I.12 ; ref : 4 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6638-9
- Scientific domain
- Electronics; Optics; Physics; Polymers, paint and wood industries
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Adsorption Charbon actif Composé organique Echange ion Evaluation performance Fabrication microélectronique Lithographie UV Miniaturisation Méthode immersion Ouverture numérique Pastille électronique Photolithographie Production masse Rayonnement UV extrême Résist amplification chimique Salle blanche
- Keyword (en)
- Adsorption Activated carbon Organic compounds Ion exchange Performance evaluation Microelectronic fabrication UV lithography Miniaturization Immersion method Numerical aperture Wafer Photolithography Mass production Vacuum ultraviolet radiation Chemically amplified resist Clean room
- Keyword (es)
- Adsorción Carbón activado Compuesto orgánico Cambio iónico Evaluación prestación Fabricación microeléctrica Litografía UV Miniaturización Método immersión Abertura numérica Pastilla electrónica Fotolitografía Producción en masa Radiación ultravioleta extrema Resistencia amplificación química Sala blanca
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19224853
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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