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Mueller polarimetry in the back focal plane

Author
DE MARTINO, A1 ; BEN HATIT, S1 ; FOLDYNA, M1
[1] Laboratoire de Physiques des Interfaces et des Couches Minces, CNRS, Ecole polytechnique, 91128 Palaiseau, France
Conference title
Metrology, inspection, and process control for microlithography XXI (26 February- 1 March 2007, San Jose, California, USA)
Conference name
Metrology, inspection, and process control for microlithography (21 ; San Jose, California 2007)
Author (monograph)
Archie, Chas N (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65180X.1-65180X.10 ; ref : 14 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-6637-2
Scientific domain
Electronics; Metrology and instrumentation; Optics; Physics
Publisher
SPIE, Bellingham, Wash
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Cristal liquide Cristal nématique Dispositif CCD Fabrication microélectronique Formation image Imageur Lithographie Ouverture numérique Plan focal Polarimètre Polarimétrie Retardateur Réseau diffraction Surface arrière 4279D
Keyword (en)
Liquid crystals Nematic crystals Charge coupled device Microelectronic fabrication Imaging Imager Lithography Numerical aperture Focal plane Polarimeter Polarimetry Retarder Diffraction grating Back surface
Keyword (es)
Cristal líquido Dispositivo carga acoplada Fabricación microeléctrica Formación imagen Imager Litografía Abertura numérica Plano focal Polarímetro Polarimetría Retardador Rejilla difracción Superficie atrás
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B79 Optical elements, devices, and systems / 001B40B79D Gratings

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F07 Charge transfer devices

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics Physics : optics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19224909

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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