Monitoring airborne molecular contamination : a quantitative and qualitative comparison of real-time and grab-sampling techniques
- Author
- SHUPP, Aaron M1 ; RODIER, Dan1 ; ROWLEY, Steven1
[1] Particle Measuring Systems, Inc, 5475 Airport Boulevard, Boulder, CO 80301, United States - Conference title
- Metrology, inspection, and process control for microlithography XXI (26 February- 1 March 2007, San Jose, California, USA)
- Conference name
- Metrology, inspection, and process control for microlithography (21 ; San Jose, California 2007)
- Author (monograph)
- Archie, Chas N (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
SEMATECH (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65183Z.1-65183Z.13
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6637-2
- Scientific domain
- Electronics; Metrology and instrumentation; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Echantillonnage Etude comparative Fabrication microélectronique Fluorescence Lithographie Mobilité ion Photolithographie Rayonnement UV extrême
- Keyword (en)
- Sampling Comparative study Microelectronic fabrication Fluorescence Lithography Ion mobility Photolithography Vacuum ultraviolet radiation
- Keyword (es)
- Muestreo Estudio comparativo Fabricación microeléctrica Fluorescencia Litografía Movilidad ión Fotolitografía Radiación ultravioleta extrema
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19225009
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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