The applications of transmission electron microscopy to the characterization of metal thin films on silicon
- Author
- CHEN, L. J; LUR, W; CHENG, J. Y
National Tsing Hua univ., dep. materials sci. eng., Hsinchu, Taiwan, Province of China - Conference name
- International Conference on Metallurgical Coatings. 16 (San Diego CA 1989-04-17)
- Source
Thin solid films. 1990, Vol 191, Num 2, pp 221-237, 17 p ; ref : 67 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Cinétique Contact métal semiconducteur Couche mince Dopage Epitaxie Etude expérimentale Implantation ion Manganèse Microscopie électronique transmission Métal transition Recuit Réaction interface Silicium Structure interface
- Keyword (en)
- Kinetics Semiconductor metal contact Thin film Doping Epitaxy Experimental study Ion implantation Manganese Transmission electron microscopy Transition metal Annealing Interface reaction Silicon Interface structure
- Keyword (es)
- Cinética Contacto metal semiconductor Capa fina Doping Epitaxia Estudio experimental Implantación ión Manganeso Microscopía electrónica transmisión Metal transición Recocido Reacción interfase Silicio Estructura interfaz
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35B Surface structure and topography
- Discipline
- Metals. Metallurgy Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19296251
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0040-6090(90)90375-N 
https://dx.doi.org/10.1016/0040-6090(90)90375-N
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