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The constitutive equation for silicon and its use in crystal growth modeling

Author
TSAI, C. T; DILLON, O. W; DE ANGELIS, R. J
Univ. Kentucky, Lexington KY 40506-0046, United States
Conference name
Winter annual meeting (Chicago IL 1988-11-27)
Source

Journal of engineering materials and technology. 1990, Vol 112, Num 2, pp 183-187, 5 p ; ref : 21 ref

CODEN
JEMTA8
ISSN
0094-4289
Scientific domain
Mechanical engineering; Mechanics acoustics
Publisher
American Society of Mechanical Engineers, New York, NY
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Contrainte résiduelle Croissance cristalline Densité dislocation Déformation plastique Equation constitutive Etude théorique Flambage Impureté Mouvement dislocation Oxygène Plasticité Relation contrainte déformation Semiconducteur Silicium Vitesse déformation
Keyword (en)
Residual stress Crystal growth Dislocation density Plastic deformation Constitutive equation Theoretical study Buckling Impurity Dislocation motion Oxygen Plasticity Stress strain relation Semiconductor materials Silicon Strain rate
Keyword (es)
Tensión residual Crecimiento cristalino Densidad dislocación Deformación plástica Ecuación constitutiva Estudio teórico Pandeo Impureza Movimiento dislocación Oxígeno Plasticidad Relación tensión deformación Semiconductor(material) Silicio Velocidad deformación
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60B Mechanical and acoustical properties of condensed matter / 001B60B20 Mechanical properties of solids / 001B60B20F Deformation and plasticity (including yield, ductility, and superplasticity)

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19348580

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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