Low pressure chemical vapor deposition of blanket tungsten using a gaseous mixture of WF6, SiH4, and H2
- Author
- PARK, H. L; YOON, S. S; PARK, C. O; CHUN, J. S
Korea advanced inst. sci. technology, dep. materials sci. eng., Seoul, Korea, Republic of - Conference name
- International conference on metallurgical coatings (San Diego CA 1989-04-17)
- Source
Thin solid films. 1989, Vol 181, Num 1-2, pp 85-93, 9 p ; ref : 16 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy
- Discipline
- Metals. Metallurgy Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19360116
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0040-6090(89)90475-6 
https://dx.doi.org/10.1016/0040-6090(89)90475-6
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