Measurement of sputtered atom energy by observation of doppler broadening of emission lines from plasma
- Author
- KOBAYASHI, K; UEHARA, Y
Fujitsu Laboratories, Ltd, Atsugi 243-01, Japan - Conference name
- International conference on metallurgical coatings. 17 (San Diego CA 1990-04-02)
- Source
Thin solid films. 1990, Vol 193-194, Num 1-2, pp 146-154, 9 p ; . 1 ; ref : 24 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy
- Discipline
- Metals. Metallurgy Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19465137
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0040-6090(05)80022-7 
https://dx.doi.org/10.1016/S0040-6090(05)80022-7
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