The LPCVD of rutile at low temperatures
- Author
- HITCHMAN, M. L1 ; ZHAO, J2
[1] Department of Pure and Applied Chemistry, University of Strathclyde, 295 Cathedral Street, Glasgow G1 1XL, United Kingdom
[2] NIBEC, University of Ulster, Newtownabbey, Co. Antrim BT37 0QB, United Kingdom - Conference title
- Proceedings of the Twelfth European Conference on Chemical Vapour Deposition. Volume I
- Conference name
- EUROCVD12 European Conference on Chemical Vapour Deposition (12 ; Sitges, Barcelona 1999-09-05)
- Author (monograph)
- FIGUERAS, A (Editor)
- Source
Journal de physique. IV. 1999, Vol 9, Num 8, pp Pr8.357-Pr8.364 ; 1 ; ref : 17 ref
- Publisher
- EDP sciences, Les Ulis
- Publication country
- France
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Anatase Basse pression Couche mince Cristallinité Croissance cristalline en phase vapeur Dépendance température Dépôt chimique phase vapeur Etat amorphe Etude expérimentale Etude phase Relation fabrication structure Rutile Structure cristalline Titane oxyde O Ti TiO2 Composé minéral Métal transition composé
- Keyword (en)
- Anatase Low pressure Thin films Crystallinity Crystal growth from vapors Temperature dependence CVD Amorphous state Experimental study Phase studies Fabrication structure relation Rutile Crystal structure Titanium oxides Inorganic compounds Transition element compounds
- Keyword (es)
- Anatasa Cristalinidad Relación fabricación estructura
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 1948090
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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