Lows-pressure MOCVD growth of ZnTe and observation of gas reaction
- Author
- NISHIO, M; OGAWA, H; YOSHIDA, A
Saga univ., fac. sci., dep. electronic eng., Honjo, Saga 840, Japan - Conference name
- ICSS [International conference on solid surfaces]. 07 (Cologne 1989-09-25)
- Source
Vacuum. 1990, Vol 41, Num 1-3, pp 715-717, 3 p ; ref : 12 ref
- CODEN
- VACUAV
- ISSN
- 0042-207X
- Scientific domain
- Metallurgy, welding; Physics
- Publisher
- Elsevier, Oxford
- Publication country
- United Kingdom
- Document type
- Conference Paper
- Language
- English
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A10 Methods of crystal growth; physics of crystal growth / 001B80A10A Theory and models of crystal growth; physics of crystal growth, crystal morphology and orientation
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19482029
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0042-207X(90)90460-G 
https://dx.doi.org/10.1016/0042-207X(90)90460-G
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