Alternative modification methods for sol-gel coatings of silica, titania and silica-titania using ultraviolet irradiation and water vapor
- Author
- IMAI, H1 ; HIRASHIMA, H1 ; AWAZU, K2
[1] Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan
[2] Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba 305-8568, Japan - Conference title
- High-performance coatings for transparent systems in large-area and/or high-volume applications
- Conference name
- International Conference on Coatings on Glass (ICCG) (ICCG) (2 ; Saarbrücken 1998-09-06)
- Author (monograph)
- PULKER, H (Editor)1 2 ; SCHMIDT, H (Editor)3 ; AERGERTER, M. A (Editor)3
INM, Institut für Neue Materialien, Saarbrücken, Germany (Funder/Sponsor)
Deutsche Glastechnische Gesellschaft, Germany (Funder/Sponsor)
[1] Balzers AG, Liechtenstein
[2] University of Innsbruck, Austria
[3] Institut für Neue Materialien, INM, Saarbrücken, Germany - Source
Thin solid films. 1999, Vol 351, Num 1-2, pp 91-94 ; ref : 19 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Composé binaire Composé ternaire Cristallisation Croissance cristalline en solution Densification Effet physique rayonnement Etude expérimentale Procédé sol gel Rayonnement UV Revêtement dur Revêtement Silicium oxyde Titane oxyde Vapeur eau Verre O Si Ti O Si O Ti Substrat verre Composé minéral Métal transition composé Oxyde
- Keyword (en)
- Binary compounds Ternary compounds Crystallization Crystal growth from solutions Densification Physical radiation effects Experimental study Sol-gel process Ultraviolet radiation Hard coating Coatings Silicon oxides Titanium oxides Steam Glass Inorganic compounds Transition element compounds Oxides
- Keyword (es)
- Revestimiento duro
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 1958668
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0040-6090(98)01784-2 
https://dx.doi.org/10.1016/S0040-6090(98)01784-2
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