Interaction of H+/H0 with O atoms in thin SiO2 films : a first-principles quantum mechanical study
- Author
- KARNA, S. P1 ; PUGH, R. D1 ; SHEDD, W. M1 ; SINGARAJU, B. B. K1
[1] Air Force Research Laboratory, Space Vehicles Directorate, 3550 Aberdeen Avenue, SE, Building 914. Kirtland AFB, NM 87117-5776, United States - Conference title
- Amorphous and crystalline insulating thin films II
- Conference name
- International Conference on Amorphous and Crystalline Insulating Thin Films (2 ; Hong Kong 1998-10-12)
- Author (monograph)
- WILSON, I. H (Editor)1 ; DEVINE, R. A. B (Editor)2
[1] Department of Electronic Engineering, The Chinese University of Hong Kong, Hong Kong, China
[2] France Telecom, CNET, Meylan, France - Source
Journal of non-crystalline solids. 1999, Vol 254, pp 66-73 ; ref : 26 ref
- CODEN
- JNCSBJ
- ISSN
- 0022-3093
- Scientific domain
- Crystallography; Chemical industry parachemical industry; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Calcul Hartree Fock Calcul ab initio Couche mince Energie liaison Etude théorique Liaison chimique Modèle amas Modèle structure Silicium oxyde O Si SiO2 Composé minéral
- Keyword (en)
- Hartree-Fock calculations Ab initio calculations Thin films Binding energy Theoretical study Chemical bonds Cluster model Structural models Silicon oxides Inorganic compounds
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography / 001B60A50 Crystalline state (including molecular motions in solids) / 001B60A50L Crystal binding; cohesive energy
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 1963619
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0022-3093(99)00375-0 
https://dx.doi.org/10.1016/S0022-3093(99)00375-0
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