Growth of nickel ferrite thin films using pulsed-laser deposition
- Author
- JOHNSON, M. T1 ; KOTULA, P. G2 ; CARTER, C. B1
[1] Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Ave. S.E., Minneapolis, MN 55455, United States
[2] Los Alamos National Laboratory, Center for Materials Science, Materials Science and Technology Division, Los Alamos National Laboratory, MS K765, Los Alamos, NM 87545, United States - Source
Journal of crystal growth. 1999, Vol 206, Num 4, pp 299-307 ; ref : 34 ref
- CODEN
- JCRGAE
- ISSN
- 0022-0248
- Scientific domain
- Crystallography; Geology; Metallurgy, welding
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Keyword (fr)
- Composé ternaire Couche mince Couche épitaxique Croissance cristalline en phase vapeur Etude expérimentale Fer oxyde Ferrites spinelles Hétéroépitaxie Laser pulsé Macle Méthode ablation laser Nickel oxyde TEM Fe Ni O NiFe2O4 Substrat saphir Composé minéral Métal transition composé
- Keyword (en)
- Ternary compounds Thin films Epitaxial layers Crystal growth from vapors Experimental study Iron oxides Ferrites spinels Heteroepitaxy Pulsed lasers Crystal twin Laser ablation technique Nickel oxides TEM Inorganic compounds Transition element compounds
- Keyword (es)
- Feritas espinelas Heteroepitaxia Macla
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15F Laser deposition
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 1967930
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0022-0248(99)00342-5 
https://dx.doi.org/10.1016/S0022-0248(99)00342-5
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