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Electrolytic and electrophoretic deposition of CeO2 films

Author
ZHITOMIRSKY, I1 ; PETRIC, A1
[1] Department of Materials Science and Engineering, McMaster University, 1280 Main Street West, Hamilton, Ontario, L8S 4L7, Canada
Source

Materials letters (General ed.). 1999, Vol 40, Num 6, pp 263-268 ; ref : 36 ref

CODEN
MLETDJ
ISSN
0167-577X
Scientific domain
Crystallography; Chemical industry parachemical industry; Condensed state physics; Polymers, paint and wood industries
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Keyword (fr)
Additif Couche mince Couche épaisse Cristallisation Céramique oxyde Cérium oxyde Dépôt électrolytique Dépôt électrophorétique Etude expérimentale Microstructure Mode opératoire Morphologie Méthode en solution Préparation chimique Recuit thermique Surface Ce O CeO2 Composé minéral Lanthanide composé
Keyword (en)
Additives Thin films Thick films Crystallization Oxide ceramics Cerium oxides Electrodeposition Electrophoretic deposition Experimental study Microstructure Operating mode Morphology Growth from solution Chemical preparation Thermal annealing Surfaces Inorganic compounds Rare earth compounds
Keyword (es)
Cerámica óxido Depósito electroforético Método operatorio Método en solución Recocido térmico
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15P Electrodeposition, electroplating

Pacs
8115P Electrodeposition, electroplating

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
1967931

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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