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Low energy ion-beam post hydrogenation of phosphor implanted amorphous silicon films

Author
GALLONI, R; RUTH, M; DESALVO, A; TSUO, Y. S
CNR, 1st LAMEL, Bologna 40126, Italy
Conference title
Hydrogen in semiconductors : bulk and surface properties, Trieste, Italy, 27-31, August 1990
Conference name
IUAP-ICTP [International Union of Pure and Applied Physics - International Centre for Theoretical Physics]. Semiconductor symposium. 06 (Trieste 1990-08-27)
Author (monograph)
STUTZMANN, Martin (Editor)1 ; CHEVALLIER, Jacques (Editor)2
International Union of Pure and Applied Physics, Göteborg, Sweden (Funder/Sponsor)
International Centre for Theoretical Physics, Trieste, Italy (Funder/Sponsor)
[1] Max-Planck-Inst., Festkörperforschung, Stuttgart 7000, Germany
[2] CNRS, lab. physique solides Bellevue, Meudon 92195, France
Source

Physica. B, Condensed matter. 1991, Vol 170, Num 1-4, pp 273-276, 4 p ; ref : 8 ref

ISSN
0921-4526
Scientific domain
Crystallography; Condensed state physics
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70B Electronic transport in condensed matter / 001B70B20 Conductivity phenomena in semiconductors and insulators / 001B70B20M Galvanomagnetic and other magnetotransport effects

Discipline
Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19704836

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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