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Fourth workshop on organometallic vapor phase epitaxy, Monterey CA, October 8 to 11, 1989

Author
STRINGFELLOW, G. B
Univ. Utah, dep. mat'ls sci. eng., Salt Lake City UT 84112, United States
Conference name
Workshop on organometallic vapor phase epitaxy. 4 (Monterey 1989-10-08)
Source

Journal of electronic materials. 1990, Vol 19, Num 4, 110 p. ; ref : dissem

CODEN
JECMA5
ISSN
0361-5235
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Institute of Electrical and Electronics Engineers, New York, NY
Publication country
United States
Document type
Conference Proceedings
Language
English
Keyword (fr)
Composé organométallique Congrès Couche mince Croissance cristalline Epitaxie Etude expérimentale Méthode phase vapeur
Keyword (en)
Organometallic compound Congress Thin film Crystal growth Epitaxy Experimental study Growth from vapor
Keyword (es)
Compuesto organometálico Congreso Capa fina Crecimiento cristalino Epitaxia Estudio experimental Método fase vapor
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35J Surface and interface dynamics and vibrations

Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19783987

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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