Single nitrogen vacancy centers in chemical vapor deposited diamond nanocrystals
- Author
- RABEAU, J. R1 ; STACEY, A2 ; RABEAU, A2 ; PRAWER, S2 ; JELEZKO, F3 ; MIRZA, I3 ; WRACHTRUP, J3
[1] Department of Physics, Division of Information and Communication Science, Macquarie University, New South Wales 2109, Australia
[2] School of Physics, Microanalytical Research Centre, the University of Melbourne, Parkville, Victoria 3010, Australia
[3] 3. Physikalisches Institut, Universität Stuttgart, Pfaffenwaldring 57, 70569 Stuttgart, Germany - Source
Nano letters (Print). 2007, Vol 7, Num 11, pp 3433-3437, 5 p ; ref : 28 ref
- Publisher
- American Chemical Society, Washington, DC
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Cristallite Diamant polycristallin Diamant synthétique Dépôt chimique phase vapeur Fluorescence Lacune Microscopie confocale Microscopie fluorescence Monocristal Nanocristal Nanomatériau 8105U 8107B 8115G
- Keyword (en)
- Crystallites Polycrystalline diamond Synthetic diamond CVD Fluorescence Vacancies Confocal microscopy Fluorescence microscopy Monocrystals Nanocrystal Nanostructured materials
- Keyword (es)
- Diamante policristal Diamante sintético Microscopía confocal Microscopía fluorescencia Nanocristal
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A05 Specific materials / 001B80A05T Fullerenes and related materials; diamonds, graphite
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A07 Nanoscale materials and structures: fabrication and characterization / 001B80A07B Nanocrystalline materials
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19859583
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1021/nl0719271 
https://dx.doi.org/10.1021/nl0719271
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