The approach to diamond growth on levitating seed particles
- Author
- SHIMIZU, Satoshi1 ; SHIMIZU, Tetsuji1 ; MORFILL, Gregor E1 ; ANNARATONE, Beatrice M1 ; JACOB, Wolfgang2 ; LINSMEIER, Christian2 ; LINDIG, Stefan2 ; STARK, Robert W3 ; JAMITZKY, Ferdinand3 ; THOMAS, Hubertus1 ; SATO, Noriyoshi4
[1] Max-Planck-Institut für extraterrestrische Physik, Giessenbachstrasse, 85748 Garching, Germany
[2] Max-Planck-Institut für Plasmaphysik, Boltzmannstrasse 2, 85748 Garching, Germany
[3] Ludwigs-Maximilians-Universität, Department für Geo-und Umweltwissenschaften, Theresienstrasse 41, 80333 München, Germany
[4] Tohoku University, Sendai 980-8579, Japan - Conference title
- Proceedings of the 13th International Conference on Solid Films and Surfaces (ICSFS 13), San Carlos de Bariloche, Argentina, 6th-10th November 2006
- Conference name
- ICSFS13 International Conference on Solid Films and Surfaces (13 ; San Carlos de Bariloche 2006-11-06)
- Author (monograph)
- ZAMPIERI, Guillermo (Editor); SANCHEZ, Esteban A (Editor); GURAYA, Mónica (Editor); ASENSIO, María C (Editor); ASCOLANI, Hugo (Editor)
- Source
Applied surface science. 2007, Vol 254, Num 1, pp 177-180, 4 p ; ref : 16 ref
- Publisher
- Elsevier Science, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Author keyword
- 52.27.Lw; 81.05.Uw; 81.15.Gh Diamond; CVD; Hot filament; Particle; Levitation
- Keyword (fr)
- Croissance cristalline Croissance film Diamant Dépôt chimique phase vapeur filament chaud Hydrogène Hétérogénéité Lévitation Nucléation Particule fine C
- Keyword (en)
- Crystal growth Film growth Diamonds Hot filament chemical vapor deposition Hydrogen Inhomogeneity Levitation Nucleation Fine particle
- Keyword (es)
- Depósito químico fase vapor filamento caliente Partícula fina
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A05 Specific materials / 001B80A05T Fullerenes and related materials; diamonds, graphite
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19891070
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.apsusc.2007.07.017 
https://dx.doi.org/10.1016/j.apsusc.2007.07.017
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