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AFM-based nanotribological and electrical characterization of ultrathin wear-resistant ionic liquid films

Author
BHUSHAN, Bharat1 ; PALACIO, Manuel1 ; KINZIG, Barbara2
[1] Nanotribology Laboratory for Information Storage and MEMS/NEMS (NLIM), The Ohio State University, 201 W 19th Ave, Columbus, OH 43210, United States
[2] Surfaces Research and Applications, Inc., 8330 Melrose Dr, Lenexa, KS 66214, United States
Source

Journal of colloid and interface science. 2008, Vol 317, Num 1, pp 275-287, 13 p ; ref : 43 ref

CODEN
JCISA5
ISSN
0021-9797
Scientific domain
Biochemistry, molecular biology, biophysics; General chemistry, physical chemistry; Nanotechnologies, nanostructures, nanoobjects; Polymers, paint and wood industries
Publisher
Elsevier, San Diego, CA
Publication country
United States
Document type
Article
Language
English
Author keyword
Adhesion Atomic force microscopy Friction Ionic liquids Kelvin probe microscopy Lubricants Resistance Surface potential Wear
Keyword (fr)
Adhérence Caractérisation Film liquide Frottement Liquide ionique Lubrifiant Microscopie force atomique Potentiel surface Résistance
Keyword (en)
Adhesion Characterization Liquid film Friction Ionic liquid Lubricant Atomic force microscopy Surface potential Resistance
Keyword (es)
Adherencia Caracterización Capa líquida Frotamiento Líquido iónico Lubricante Microscopía fuerza atómica Potencial superficie Resistencia
Classification
Pascal
001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01I Surface physical chemistry

Pascal
001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01J Colloidal state and disperse state

Discipline
General chemistry and physical chemistry
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19904178

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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