A novel overlay process for imprint lithography using load release and alignment error pre-compensation method
- Author
- JINYOU SHAO1 ; YUCHENG DING1 ; YIPING TANG1 ; HONGZHONG LIU1 ; BINGHENG LU1 ; DONGYIN CUI1
[1] The State Key Lab for Manufacturing Systems Engineering, Xi'an Jiaotong University, 28, Xianning Westroad, Xi'an, Shaanxi 710049, China - Source
Microelectronic engineering. 2008, Vol 85, Num 1, pp 168-174, 7 p ; ref : 13 ref
- CODEN
- MIENEF
- ISSN
- 0167-9317
- Scientific domain
- Electronics
- Publisher
- Elsevier Science, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- Alignment Imprint lithography Load release Overlay Pre-compensation
- Keyword (fr)
- Alignement optique Analyse coût efficacité Correction erreur Diminution coût Distorsion signal Défaut alignement Fabrication microélectronique Formation motif Frottement Lithographie Optimisation Pastille électronique Photolithographie Résist
- Keyword (en)
- Optical alignment Cost efficiency analysis Error correction Cost lowering Signal distortion Alignment defect Microelectronic fabrication Patterning Friction Lithography Optimization Wafer Photolithography Resist
- Keyword (es)
- Alineación óptica Análisis costo eficacia Corrección error Reducción costes Distorsión señal Defecto alineación Fabricación microeléctrica Formacíon motivo Frotamiento Litografía Optimización Pastilla electrónica Fotolitografía Resistencia
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19977011
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.mee.2007.05.004 
https://dx.doi.org/10.1016/j.mee.2007.05.004
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