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Electrodeposition and characterization of silane thin films from 3-(aminopropyl)triethoxysilane

Author
HERLEM, Guillaume1 ; SEGUT, Olivier1 ; ANTONIOU, Alexandros1 ; ACHILLEOS, Christine2 ; DUPONT, Didier2 ; BLONDEAU-PATISSIER, Virginie3 ; GHARBI, Tijani4
[1] Institut UTINAM UMR CNRS 6213, Bât. N, Université de Franche-Comté, UFR Sciences and Techniques, 16 route de Gray, 25030 Besancon, France
[2] URTAL, INRA, B.P. 20089, 39801 Poligny, France
[3] Femto-ST/LPMO CNRS UMR 6174, 25030 Besancon, France
[4] Femto-ST/LOPMD CNRS UMR 6174, 25030 Besancon, France
Source

Surface & coatings technology. 2008, Vol 202, Num 8, pp 1437-1442, 6 p ; ref : 16 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Author keyword
3-(aminopropyl)triethoxysilane Electrodeposition Ellipsometry Scanning tunneling microscopy Surface plasmon resonance X-ray photoelectron spectroscopy
Keyword (fr)
Couche mince Dépôt électrolytique Ellipsométrie Microscopie tunnel balayage Revêtement métallique Traitement surface
Keyword (en)
Thin films Electrodeposition Ellipsometry Scanning tunneling microscopy Metal coating Surface treatments
Keyword (es)
Revestimiento metálico
Keyword (de)
Metallischer Ueberzug
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment / 001D11C06D Metallic coatings

Discipline
Metals. Metallurgy Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20007201

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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