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Sputtering gases and pressure effects on the microstructure, magnetic properties and recording performance of TbFeCo films

Author
MURAKAMI, Motoyoshi1 ; BIRUKAWA, Masahiro1
[1] The A V Core Technology Development Center, Matsushita Electric Industrial Co., Ltd., 1006 Kadoma, Kadoma, Osaka, 571-8501, Japan
Source

Journal of magnetism and magnetic materials. 2008, Vol 320, Num 5, pp 608-611, 4 p ; ref : 10 ref

CODEN
JMMMDC
ISSN
0304-8853
Scientific domain
Electronics; Condensed state physics
Publisher
Elsevier Science, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Amorphous thin film Coercivity Magnetic property Microstructure Perpendicular magnetic anisotropy Recording characteristic
Keyword (fr)
Alliage amorphe Ancrage paroi Couche mince Domaine magnétique Dépôt pulvérisation Effet Kerr magnétooptique Force coercitive Hystérésis magnétique Matériau enregistrement Matériau magnétique Microscopie force magnétique Microstructure Paroi domaine Relation fabrication propriété Structure basaltique Alliage TbFeCo
Keyword (en)
Amorphous alloy Wall pinning Thin films Magnetic domains Sputter deposition Kerr magneto-optical effect Coercive force Magnetic hysteresis Recording material Magnetic materials Magnetic force microscopy Microstructure Domain walls Fabrication property relation Columnar structure
Keyword (es)
Aleación amorfa Material grabación Relación fabricación propiedad Estructura columnar
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70E Magnetic properties and materials / 001B70E70 Magnetic properties of surface, thin films and multilayers / 001B70E70A Magnetic properties of monolayers and thin films

Discipline
Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20016287

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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