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Alumina atomic layer deposition nanocoatings on primary diamond particles using a fluidized bed reactor

Author
XINHUA LIANG1 ; ZHAN, Guo-Dong2 ; KING, David M1 ; MCCORMICK, Jarod A1 ; ZHANG, John2 ; GEORGE, Steven M1 ; WEIMER, Alan W1
[1] Department of Chemical and Biological Engineering, University of Colorado, Boulder, Colorado 80309, United States
[2] Smith International, Inc, Houston, Texas 77205, United States
Source

Diamond and related materials. 2008, Vol 17, Num 2, pp 185-189, 5 p ; ref : 35 ref

ISSN
0925-9635
Scientific domain
Crystallography
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Alumina film Atomic layer deposition (ALD) Fluidized bed reactor
Keyword (fr)
Aire superficielle Alumine Couche ultramince Croissance cristalline en phase vapeur Diamant Effet pression Lit fluidisé Microscopie électronique balayage transmission Méthode couche atomique Oxyde d'aluminium Plasma couplé inductivement Revêtement Spectre photoélectron RX Taux croissance Vibration 8105U 8115K
Keyword (en)
Surface area Alumina Ultrathin films Crystal growth from vapors Diamonds Pressure effects Fluidized beds Scanning transmission electron microscopy Atomic layer method Aluminium oxide Inductively coupled plasma Coatings X-ray photoelectron spectra Growth rate Vibrations
Keyword (es)
Método capa atómica Aluminio óxido
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A05 Specific materials / 001B80A05T Fullerenes and related materials; diamonds, graphite

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15K Vapor phase epitaxy; growth from vapor phase

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20028395

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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