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Femtosecond laser damage threshold and nonlinear characterization in bulk transparent SiC materials

Author
DESAUTELS, G. Logan1 ; BREWER, Chris2 ; WALKER, Mark3 ; JUHL, Shane2 ; FINET, Marc1 ; RISTICH, Scott1 ; WHITAKER, Matt1 ; POWERS, Peter4
[1] AT&T Government Solutions, Dayton , Ohio 45433, United States
[2] Air Force Research Laboratory, Materials and Manufacturing Directorate, Wright-Patterson Air Force Base, Ohio 45433, United States
[3] General Dynamics Information Tech, Dayton, Ohio 45431, United States
[4] University of Dayton, Dayton, Ohio 45469, United States
Source

Journal of the Optical Society of America. B, Optical physics (Print). 2008, Vol 25, Num 1, pp 60-66, 7 p ; ref : 16 ref

CODEN
JOBPDE
ISSN
0740-3224
Scientific domain
Optics
Publisher
Optical Society of America, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Balayage en Z Composé binaire Domaine temps fs Détérioration par rayonnement Etude expérimentale Laser pulsé Matériau transparent Méthode mesure Optique non linéaire Processus n photons Semiconducteur Silicium Carbure Spectre UV visible 4288 SiC
Keyword (en)
Z scan Binary compounds fs range Radiation damage Experimental study Pulsed lasers Transparent material Measuring methods Nonlinear optics Multi-photon processes Semiconductor materials Silicon Carbides Ultraviolet visible spectrum
Keyword (es)
Barrido Z Deteriorización por irradiación Material transparente Espectro UV visible
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B88 Radiation effects on optical elements, devices, and systems

Discipline
Physics : optics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20036653

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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