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Selective metallization of photostructurable glass by femtosecond laser direct writing for biochip application

Author
HANADA, Y1 ; SUGIOKA, K1 ; MIDORIKAWA, K1
[1] RIKEN -The Institute of Physical and Chemical Research, 2-1 Hirosawa, Wako, Saitama 351-0198, Japan
Source

Applied physics. A, Materials science & processing (Print). 2008, Vol 90, Num 4, pp 603-607, 5 p ; ref : 24 ref

ISSN
0947-8396
Scientific domain
Electronics; Optics; Condensed state physics
Publisher
Springer, Berlin
Publication country
Germany
Document type
Article
Language
English
Keyword (fr)
Adhérence Couche mince Cuivre Dépôt électrolytique Ecriture laser Microréseau Métallisation Processus n photons Surface rugueuse Transformation photostructurale Verre Verre FOTURAN
Keyword (en)
Adhesion Thin film Copper Electrodeposition Laser writing Microarray Metallizing Multiphoton process Rough surface Photostructural transformations Glass
Keyword (es)
Adherencia Capa fina Cobre Depósito electrolítico Escritura láser Microarreglo Metalización Proceso n fotones Superficie rugosa Vidrio
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20040610

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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