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A numerical investigation of atomic oxygen density in an inductively coupled plasma in O2/Ar mixture

Author
SATO, Toshikazu1 ; MAKABE, Toshiaki1
[1] Department of Electronics and Electrical Engineering, Keio University, 3-14-1 Hiyoshi, Yokohama 223-8522, Japan
Source

Journal of physics. D, Applied physics (Print). 2008, Vol 41, Num 3 ; 035211.1-035211.6 ; ref : 50 ref

CODEN
JPAPBE
ISSN
0022-3727
Scientific domain
Condensed state physics; Physics; Plasma physics
Publisher
Institute of Physics, Bristol
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Etude théorique Excitation impact électron Mécanisme production Oxygène Plasma couplé inductivement Répartition spatiale Simulation numérique 5280Y
Keyword (en)
Theoretical study Electron impact excitation Production mechanisms Oxygen Inductively coupled plasma Spatial distribution Digital simulation
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B80 Electric discharges / 001B50B80Y Discharges for spectral sources (including inductively coupled plasmas)

Discipline
Physics of gases, plasmas and electric discharges
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20050069

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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