A study of atmospheric-pressure CHF3/Ar plasma treatment on dielectric characteristics of polyimide films
- Author
- PARK, Soo-Jin1 ; LEE, Eun-Jung1 ; KIM, Byung-Joo2
[1] Department of Chemistry, Inha University, 253, Nam-gu, Incheon 402-751, Korea, Republic of
[2] Department of Green Chemistry & Environmental Biotechnology, University of Science & Technology, P.O. Box 107, Yuseong, Daejeon 305-600, Korea, Republic of - Source
Journal of colloid and interface science. 2008, Vol 319, Num 1, pp 365-369, 5 p ; ref : 15 ref
- Publisher
- Elsevier, San Diego, CA
- Publication country
- United States
- Document type
- Article
- Language
- English
- Author keyword
- Atmospheric-pressure CHF3/Ar plasma Deformation Fluorine Polarizability Polyimide film
- Keyword (fr)
- Déformation Film Fluor Imide polymère Plasma Polarisabilité Pression atmosphérique
- Keyword (en)
- Deformation Film Fluorine Polyimide Plasma Polarizability Atmospheric pressure
- Keyword (es)
- Deformación Película Fluor Imida polímero Plasma Polarizabilidad Presión atmosférica
- Classification
- Pascal
- 001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01I Surface physical chemistry
- Pascal
- 001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01J Colloidal state and disperse state
- Discipline
- General chemistry and physical chemistry
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20056807
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.jcis.2007.08.003 
https://dx.doi.org/10.1016/j.jcis.2007.08.003
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