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A refined Ehrlich-Schwoebel effect on the modification of Si surface nanostructures by post ion milling

Author
JING ZHOU1 ; FAN, Wen-Bin1 ; CHEN, Wen-Bin2 ; ZHAO, You-Yuan1 ; MING LU1
[1] State Key Laboratory for Advanced Photonic Materials and Devices, and Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China
[2] Department of Mathematics, Fudan University, Shanghai 200433, China
Source

Applied surface science. 2008, Vol 254, Num 8, pp 2238-2243, 6 p ; ref : 40 ref

ISSN
0169-4332
Scientific domain
General chemistry, physical chemistry; Crystallography; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
Elsevier Science, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
68.35.Bs 68.37.Ps 68.49.Sf Atomic force microscopy Ion bombardment Morphology Roughening and topography Silicon Surface structure
Keyword (fr)
Microscopie force atomique Silicium Structure surface Topographie surface Si
Keyword (en)
Atomic force microscopy Silicon Surface structure Surface topography
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20107206

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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