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A simple method for high yield fabrication of sharp silicon tips

Author
BURT, D. P1 ; DOBSON, P. S1 ; DONALDSON, L1 ; WEAVER, J. M. R1
[1] Department of Electronic and Electrical Engineering, University of Glasgow, Glasgow, United Kingdom
Source

Microelectronic engineering. 2008, Vol 85, Num 3, pp 625-630, 6 p ; ref : 32 ref

CODEN
MIENEF
ISSN
0167-9317
Scientific domain
Electronics
Publisher
Elsevier Science, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Anisotropic etching Atomic force microscopy Silicon tips
Keyword (fr)
Cathode pointe Cathode émission champ Gravure Microscopie force atomique Pointe microscope Procédé fabrication Procédé voie humide Rayon courbure Silicium Si
Keyword (en)
Tip emitter Field emitter Engraving Atomic force microscopy Microscope tip Manufacturing process Wet process Radius of curvature Silicon
Keyword (es)
Cátodo punta Cátodo emisión campo Grabado Microscopía fuerza atómica Punta microscopio Procedimiento fabricación Procedimiento vía húmeda Radio curvatura Silicio
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F19 Vacuum microelectronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20109838

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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